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Exploring the role of −NH2functional groups of ethylenediamine in chemical mechanical polishing of GCr15 bearing steel

Frictionvolume9,pages1673–1687 (2021)Cite this article

Abstract

Ethylenediamine with two −NH2functional groups was used as a critical complexing agent in chemical mechanical polishing (CMP) slurries for a high carbon chromium GCr15 bearing steel (equivalent to AISI 52100). The polishing performance and corresponding mechanism of −NH2functional groups were thoroughly investigated as a function of pH. It is revealed that, when polished with ethylenediamine and H2O2-based slurries, the material removal rate (MRR) and surface roughnessRaof GCr15 steel gradually decrease as pH increases. Compared with acidic pH of 4.0, at alkaline pH of 10.0, the surface film of GCr15 steel has much higher corrosion resistance and wear resistance, and thus the material removal caused by the pure corrosion and corrosion-enhanced wear are greatly inhibited, resulting in much lower MRR andRa. Moreover, it is confirmed that a more protective composite film, consisting of more Fe3+hydroxides/oxyhydroxides and complex compounds with −NH2functional groups of ethylenediamine, can be formed at pH of 10.0. Additionally, the polishing performance of pure iron and a medium carbon 45 steel exhibits a similar trend as GCr15 steel. The findings suggest that acidic pH could be feasible for amine groups-based complexing agents to achieve efficient CMP of iron-based metals.

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Acknowledgements

The authors are grateful for the financial supports by National Natural Science Foundation of China (51975488, 51991373, and 51605396), National Key R&D Program of China (2018YFB2000400), Science Challenge Project (TZ2018006), Tribology Science Fund of State Key Laboratory of Tribology (SKLTKF16A02), and Laboratory of Precision Manufacturing Technology CAEP (ZD17005).

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Affiliations

  1. Tribology Research Institute, State Key Laboratory of Traction Power, Southwest Jiaotong University, Chengdu, 610031, China

    Hanqiang Wu, Liang Jiang, Xia Zhong, Jinwei Liu & Linmao Qian

  2. School of Mechanical Engineering, Southwest Jiaotong University, Chengdu, 610031, China

    Na Qin

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  1. Hanqiang Wu
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Correspondence toLiang Jiang.

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Hanqiang WU. He received his bachelor degree in mechanical engineering in 2017 from Southwest Jiaotong University, Chengdu, China, and his master degree in mechanical engineering in 2020 from the same university. He is currently a Ph.D. in the Laboratory for Extreme Manufacturing Science at Southern University of Science and Technology. His research interest includes chemical mechanical polishing and ultrasonic assisted plasma oxidation grinding.

Liang JIANG. He is an associate professor in mechanical engineering at Southwest Jiaotong University, Chengdu, China. He received his bachelor degree in mechanical engineering in 2009 from Harbin Institute of Technology, Harbin, China, and his Ph.D. degree in mechanical engineering in 2015 from Tsinghua University, Beijing, China. During the period 2010–2012, he studied as a joint Ph.D. student in Clarkson University, Potsdam, New York, USA. Then he joined the faculty at Southwest Jiaotong University in 2015. His research interest focuses on chemical mechanical polishing.

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Wu, H., Jiang, L., Zhong, X.et al.Exploring the role of −NH2functional groups of ethylenediamine in chemical mechanical polishing of GCr15 bearing steel.Friction9,1673–1687 (2021). https://doi.org/10.1007/s40544-020-0460-6

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Keywords

  • chemical mechanical polishing (CMP)
  • complexing agent
  • bearing steel